In this paper,
InGaAsN thin films were deposited by Thermionic Vacuum Arc (TVA) for the first
time. Deposition parameters were determined. These films were grown on
different type substrate material. These are glass, Si and poly Polyethylene
terephthalate (PET) materials. Crystal structures of the produced
samples were investigated by XRD analysis of the produced samples. Atomic
concentrations of the deposited samples were investigated by EDX. The surface properties of the films were
imaged by atomic force microscopy. Band gap values were calculated by optical
method from the absorbance spectra of the UV-Vis spectrophotometer. According
to obtained results, different atomic ratios were detected.
Bu çalışmada InGaAsN ince filmler ilk defa farklı
bir teknik olan Termiyonik Vakum Ark (TVA) tekniği ile üretilmiştir. InGaAsN
ince filmler üretilirken TVA üretim parametreleri belirlenmiştir. İnce filmler
üç farklı alt taş üzerine gerçekleştirilmiştir. Bunlar cam, Si ve Polietilen
tereftalat (PET) alt taş malzemedir.
Üretilen ince filmlerin XRD analizleri ile kristal yapıları
aydınlatılmaya çalışılmıştır. Yüzey bileşenleri için EDX analizi
kullanılmıştır. Filmlerin yüzey oluşumları atomik kuvvet mikroskobu ile
görüntülendi. UV-Vis spektrofotometresi ile elde edilen soğurma değerlerinden
ise yapıların yasak enerji aralıkları değerleri incelenmiştir. Sonuçlara göre, farklı alt taşlar üzerine
farklı atomik bileşimler elde edilmiştir.
Subjects | Engineering |
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Journal Section | Research Articles |
Authors | |
Publication Date | August 29, 2017 |
Submission Date | April 5, 2016 |
Acceptance Date | July 20, 2017 |
Published in Issue | Year 2017 Volume: 22 Issue: 2 |
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